Functionalized TiO₂ nanoparticles by single-step hydrothermal synthesis: the role of the silane coupling agents

• Antoine R. M. Dalod,
• Lars Henriksen,
• Tor Grande and
• Mari-Ann Einarsrud

Beilstein J. Nanotechnol. 2017, 8, 304–312, doi:10.3762/bjnano.8.33

• -functionalized samples, Si–O–Si bands at 1020 and 1120 cm−1 and the Ti–O–Si shoulder at 910 cm−1 confirmed that the silanes react via a condensation mechanism, cross-link, and covalently bond on the surface of the TiO2 nanoparticles [15][16][36]. The degree of order in the organic monolayer can be qualitatively

Two step formation of metal aggregates by surface X-ray radiolysis under Langmuir monolayers: 2D followed by 3D growth

• Smita Mukherjee,
• Marie-Claude Fauré,
• Michel Goldmann and
• Philippe Fontaine

Beilstein J. Nanotechnol. 2015, 6, 2406–2411, doi:10.3762/bjnano.6.247

• were able to form a dense, metallic silver layer anchored underneath an organic monolayer by irradiating with an X-ray beam in grazing incidence geometry, a Langmuir monolayer (mono-molecular layer of insoluble surfactant molecules) deposited on the free surface of a silver-ion aqueous solution. The

• spectra during the radiolysis process, we proved that the metal layer anchored to the organic monolayer consisted of silver atoms organized in thin crystallites oriented by the interface [4]. We also studied the kinetics of formation of this silver layer by total reflection X-ray fluorescence (TRXF) and

Entropy effects in the collective dynamic behavior of alkyl monolayers tethered to Si(111)

• Christian Godet

Beilstein J. Nanotechnol. 2015, 6, 583–594, doi:10.3762/bjnano.6.60

• spectroscopy; dipolar relaxation; entropy; gauche defect; organic monolayer; Introduction Self-assembled monolayers (SAM) and organic molecular layers (OML) have attracted great interest over the past two decades because surface functionalization offers great flexibility for a molecular-level control of

• acid dipoles. This indicates that the weak electrostatic pressure does not induce strong effects on their dipolar strength, which could arise, e.g., from a collapse of the organic monolayer. In contrast, mechanism B2 attributed to gauche defects is enhanced at high temperatures and high dc bias. This

• experiments precludes further conclusions. Conclusion This fundamental admittance spectroscopy study provides new guidelines to identify the contribution of activated dipolar relaxation mechanisms and to discriminate the response of electrically active interface defects in organic monolayer/semiconductor

Nanocrystalline ceria coatings on solid oxide fuel cell anodes: the role of organic surfactant pretreatments on coating microstructures and sulfur tolerance

• Chieh-Chun Wu,
• Ling Tang and
• Mark R. De Guire

Beilstein J. Nanotechnol. 2014, 5, 1712–1724, doi:10.3762/bjnano.5.181

• -linked organic monolayer on the pore walls of the electrode. Then the specimens were refluxed with 7% potassium thioacetate in ethanol at 80 °C for 16 h to replace the –Br end groups with thioacetate (-SCOCH3). Lastly, the thioacetate was converted to sulfonate (-SO3H) by exposing the anode to saturated

Functionalised zinc oxide nanowire gas sensors: Enhanced NO₂ gas sensor response by chemical modification of nanowire surfaces

• Eric R. Waclawik,
• Jin Chang,
• Andrea Ponzoni,
• Isabella Concina,
• Dario Zappa,
• Elisabetta Comini,
• Nunzio Motta,
• Guido Faglia and
• Giorgio Sberveglieri

Beilstein J. Nanotechnol. 2012, 3, 368–377, doi:10.3762/bjnano.3.43

• chemisorption involves electronic charge transfer, functionalisation of the surface of a metal-oxide semiconductor gas sensor with an organic monolayer will strongly influence the electronic properties of the surface. Transfer of electron density into the semiconductor will reduce the depletion layer, which is

• temperature range that the dodecanethiol-coated or THMA-coated sensors could operate in without there being a significant breakdown of the organic monolayer coating. Inspection of Figure 5 reveals that only minor mass-loss peaks occurred between room temperature and 200 °C, corresponding to desorption of

Parallel- and serial-contact electrochemical metallization of monolayer nanopatterns: A versatile synthetic tool en route to bottom-up assembly of electric nanocircuits

• Jonathan Berson,
• Assaf Zeira,
• Rivka Maoz and
• Jacob Sagiv

Beilstein J. Nanotechnol. 2012, 3, 134–143, doi:10.3762/bjnano.3.14

• nucleate and grow; (iii) there is no metal nucleation and growth in pinhole defects in the organic monolayer that might not be detected by the SFM imaging, so that metal deposited by the present CET process necessarily resides only on the outer surface of the monolayer template, with full preservation of

• dense –COOH functionality of the organic monolayer facilitates the establishment of a sufficiently high local concentration of chemisorbed Ag+ ions through the conversion of carboxylic acid groups to the carboxylate salt (–COO−Ag+). In contrast with OTSeo, metal deposition by this mechanism on a

Substrate-mediated effects in photothermal patterning of alkanethiol self-assembled monolayers with microfocused continuous-wave lasers

• Anja Schröter,
• Mark Kalus and
• Nils Hartmann

Beilstein J. Nanotechnol. 2012, 3, 65–74, doi:10.3762/bjnano.3.8

• continuous-wave lasers. The lateral resolution, generally, depends on both the type of the organic monolayer and the nature of the substrate. In previous studies we reported on photothermal patterning of distinct types of SAMs on Si supports. In this contribution, a systematic study on the impact of the

Direct monitoring of opto-mechanical switching of self-assembled monolayer films containing the azobenzene group

• Einat Tirosh,
• Enrico Benassi,
• Silvio Pipolo,
• Marcel Mayor,
• Michal Valášek,
• Veronica Frydman,
• Stefano Corni and
• Sidney R. Cohen

Beilstein J. Nanotechnol. 2011, 2, 834–844, doi:10.3762/bjnano.2.93

• appropriate for organic monolayer systems [16]. Another consideration for nanoindentation measurements is the substrate effect. "Buckle's rule" maintains that in order to gain information on the film only, and not the substrate, the depth of penetration into the film must not exceed 10% of the total film